Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition

Villegas, Rodrigo

Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition

dc.contributor.author	Villegas, Rodrigo
dc.coverage.spatial	Netherlands
dc.date.accessioned	2025-12-05T16:54:49Z
dc.date.available	2025-12-05T16:54:49Z
dc.date.issued	2025-06-20
dc.description.abstract	Efficient and cost-effective methods to create photovoltaic materials are constantly being sought, with metal oxides like TiO2 playing a key role in this field. In this study, TiO2 thin films were grown on glass substrates using a dual radiofrequency (RF) plasma-enhanced pulsed laser deposition (PLD) system with a thermal budget that remained below 400 ◦C. The physical, chemical, and optical properties of the deposited thin films were studied as a function of low- and high-RF powers as well as deposition time. These parameters were found to impact the proportion of anatase and rutile phase and their crystallinity, as well as the oxygen vacancy concentration and band gap energy. These findings demonstrated the utility of dual RF plasma-enhanced PLD for precise modulation of TiO2 thin-films, offering promising applications in photovoltaics and photocatalysis.
dc.identifier.citation	Applied Surface Science 709 (2025) 163872
dc.identifier.doi	https://doi.org/10.1016/j.apsusc.2025.163872
dc.identifier.issn	0169-4332
dc.identifier.orcid	https://orcid.org/0000-0003-4225-7106
dc.identifier.uri	https://hdl.handle.net/20.500.12254/7395
dc.language.iso	eng
dc.publisher	Elsevier
dc.rights	Acceso abierto
dc.rights.license	Atribución-NoComercial-CompartirIgual 3.0 Chile (CC BY-NC-SA 3.0 CL)
dc.rights.uri	https://creativecommons.org/licenses/by-nc-sa/3.0/cl/
dc.subject	Radio Frequency Plasma
dc.subject.nabs	06 - Producción y tecnología industrial
dc.subject.oecd	2.5.1 - Ingeniería de los Materiales\|\|1.3.9 - Otras Especialidades de la Física
dc.subject.tech	Mat - Materiales Avanzados
dc.title	Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition
dc.type	Article
dc.type.coar	http://purl.org/coar/resource_type/c_6501
dcterms.accessRights	El artículo no puede ser publicado en el Repositorio Institucional debido a los permisos de copyright definidos por la editorial publicadora. Diríjase al DOI.